Dawei Yang
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- Sorted by Year/Conf, Year/Citation, Citation
| 2007 | ||
|---|---|---|
| 1 | Investigation of Zr-N thin films for use as diffusion barrier in Cu metallization. Ying Wang, Fei Cao, Minghui Ding, Dawei Yang. Microelectronics Journal (38): 910-914 (2007). Web SearchBibTeXDownload | |
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