Wei-Hua Li

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2007
1A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching Process Simulation. Zai-Fa Zhou, Qing-An Huang, Wei-Hua Li, Wei Lu. IEEE Trans. on CAD of Integrated Circuits and Systems (26): 100-114 (2007). Web SearchBibTeXDownload
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